Electrical characteristics of arc-free high-power pulsed sputtering glow plasma
| Autor: | Tadao Okimoto, Ryosuke Mieda, Ken Yukimura, Hiroshi Tamagaki |
|---|---|
| Rok vydání: | 2008 |
| Předmět: |
Glow discharge
Materials science Analytical chemistry Surfaces and Interfaces General Chemistry Insulated-gate bipolar transistor Plasma Sputter deposition Condensed Matter Physics Surfaces Coatings and Films Sputtering Materials Chemistry High-power impulse magnetron sputtering Atomic physics Current density Power density |
| Zdroj: | Surface and Coatings Technology. 202:5246-5250 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/j.surfcoat.2008.06.021 |
| Popis: | A high power pulsed sputtering (HPPS) plasma is generated using a Penning discharge, and is featured to be highly ionized in a glow discharge mode. An electric field and a magnetic field are parallel to each other. Argon ions are initially produced in the plasma and are accelerated towards the cathode as a sputtering target. An arc-free plasma can be realized by adjusting a pulse width of the rectangular-shaped voltage of the power supply, using the switching of insulated gate bipolar transistor (IGBT) devices. The plasma source has features as follows: (1) the plasma generation unit is small with a volume of 60x60x60 mm 3 ,(2) a power density is on the order of a few kW/cm 2 for a gap length of 10 mm. For a power-supply voltage of- 1.6 kV and an argon pressure of 2.0 Pa, a plasma current is approximately 57 A at a current limiting resistance of 20 Ω. The current density is approximately 2.4 A/cm 2 . The instantaneous peak power is approximately 25 kW, which corresponds to a power density of approximately 1 kW/cm 2 . The energy consumed in the plasma per shot is approximately 0.65 J, which results in an average power of approximately 410 W at a repetition rate of 625 Hz. The plasma density is estimated to be on the order of 10 13 cm - 3 . © 2008 Elseiver BV All rights reserved. |
| Databáze: | OpenAIRE |
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