A highly reliable mask inspection system
| Autor: | B. Tsujiyama, K. Kurihara, K. Saito |
|---|---|
| Rok vydání: | 1980 |
| Předmět: |
Scheme (programming language)
Engineering business.industry Binary number Mask inspection Electronic Optical and Magnetic Materials Image (mathematics) Logic gate Electronic engineering Pickup Computer vision Software system Artificial intelligence Electrical and Electronic Engineering business computer computer.programming_language Data compression |
| Zdroj: | IEEE Transactions on Electron Devices. 27:1284-1290 |
| ISSN: | 0018-9383 |
| DOI: | 10.1109/t-ed.1980.20022 |
| Popis: | An automatic system for inspecting micro mask defects with 1-µm minimum detectable size has been developed. An outline of the system is as follows: The pattern image obtained with a pickup tube is converted into binary video signals which are transferred into two parallel logic circuits for detecting pattern defects. One is based on the pattern-analyzing method, for which one of four algorithms for detecting micro defects is presented in detail. The other is based on the design-pattern data-comparing method, where the data compression scheme and a new idea for avoiding mask alignment errors are adopted. A software system outline, very important in assisting the hardware functions in this system, is also presented. The results of experiments for determining system performance indicate that the system can detect ≥1-µm diameter defects or loss patterns with high probability by complimentary use of the two methods. A 4-in by 4-in mask can be inspected within 100 rain. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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