Ge films on Au(111) and Al(111): thermal stability

Autor:	J. D. Fuhr, M. L. Martiarena, Esteban A. Sanchez, E. D. Cantero, O. Grizzi, E. Martinez
Rok vydání:	2019
Předmět:	010302 applied physics Materials science Annealing (metallurgy) Desorption 0103 physical sciences Analytical chemistry Thermal stability 02 engineering and technology 021001 nanoscience & nanotechnology 0210 nano-technology 01 natural sciences
Zdroj:	Materials Today: Proceedings. 14:148-151
ISSN:	2214-7853
DOI:	10.1016/j.matpr.2019.05.073
Popis:	We present an analysis of Ge films grown on Au(111) and Al(111) under UHV conditions, including studies on the desorption and segregation of Ge. For desorption of a multilayer Ge/Au film, a two-step process was observed with a smooth transition in the 500-770 K range. For the case of Ge/Al a sharp desorption process takes place at ∼500 K. The final products at the surface are also different; no Ge was found after annealing the Ge/Al sample, while some Ge (of the order of 10% of ML) was found after annealing the Ge/Au sample; attributed to segregation from the bulk.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9f23fbb68c7ba0eab24db38039c510da https://doi.org/10.1016/j.matpr.2019.05.073 Zobrazit plný text záznamu Full Text from ScienceDirect