17.1: Invited Paper: Direction of Low-Temperature p-Si Technology

Autor: Masanori Sakamoto, Koichi Kanzaki
Rok vydání: 2001
Předmět:
Zdroj: SID Symposium Digest of Technical Papers. 32:242
ISSN: 0097-966X
DOI: 10.1889/1.1831841
Popis: Low temperature p-Si technology road map is proposed and discussed focusing on the evollution of TFT performance and integration density. Integration of DAC and control circuits will realize lighter-weight and lower cost display, where, higher resolution and larger display size require higher TFT performance. While, higher integration density enables multi-bits(∼ 8bits) memories in pixels and significantly reduces the driving power consumption. Another key is the combination of OLED, which will replace LCD and become the main stream flat panel technology.
Databáze: OpenAIRE