Weak Polyelectrolyte Brush Arrays Fabricated by Combining Electron-Beam Lithography with Surface-Initiated Photopolymerization
| Autor: | Stefan Zauscher, Jianxin Feng, Daniel J. Dyer,§ and, Woo-Kyung Lee, Bruce LaMattina, Marian Kaholek |
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| Rok vydání: | 2006 |
| Předmět: |
chemistry.chemical_classification
Materials science General Chemical Engineering Radical polymerization technology industry and agriculture Nanotechnology General Chemistry Polymer Polymer brush Polyelectrolyte Photopolymer chemistry Materials Chemistry Copolymer Lithography Electron-beam lithography |
| Zdroj: | Chemistry of Materials. 18:3660-3664 |
| ISSN: | 1520-5002 0897-4756 |
| DOI: | 10.1021/cm060276r |
| Popis: | We present a simple “top-down/bottom-up” strategy to fabricate nano- and micropatterned polymer brush arrays composed of pH- and salt-sensitive, weak polyelectrolyte copolymers [poly(N-isopropylacrylamide-co-methacrylic acid, 3:1, poly(NIPAAM-co-MAA)]. In our approach, a silicon surface is first patterned with gold, using “lift-off” electron-beam lithography (“top-down”), and the resulting pattern is then amplified by surface-initiated photopolymerization by conventional, UV-light-induced free radical polymerization (“bottom-up”) from an immobilized 2,2‘-azobisisobutyronitrile (AIBN) type initiator. The use of pH- and ionic-strength-sensitive comonomers in the copolymer brush enables large, externally triggered conformational changes of the micro- and nanopatterned polymer brushes. We observed that the height of nanopatterned ionized polymer brushes increases with increasing feature size of the pattern. The design and fabrication of surfaces with conformationally switchable, patterned polymeric structures... |
| Databáze: | OpenAIRE |
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