Erratum to 'The impact of nitrogen on the defect aggregation in silicon'

Autor: Robert Dipl.-Chem. Dr. Hölzl, D Gräf, E. Dornberger, W. von Ammon, Janis Virbulis, Ruediger Schmolke
Rok vydání: 2002
Předmět:
Zdroj: Journal of Crystal Growth. 240:330
ISSN: 0022-0248
DOI: 10.1016/s0022-0248(01)02394-6
Popis: We are greatly indebted to V.V. Voronkov of MEMC, who made us aware of an error in our above paper. By mistake, the wrong V=G curve is shown in Fig. 5. The wrong curve relates to older calculations with inappropriate boundary conditions. The below figure shows the correct shape of V=G as determined by calculations which considered inductive heating effects at the circumference of the growing crystal and used the measured growth interface as a boundary condition (see Section 4 on page 23). We apologize for this careless mistake.
Databáze: OpenAIRE