Diffusion of 195Au in amorphous W-N diffusion barriers
| Autor: | P.J. Pokela, W. Dörner, Helmut Mehrer, Elzbieta Kolawa, M.-A. Nicolet |
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| Rok vydání: | 1991 |
| Předmět: |
Ion beam sputtering
Materials science Silicon Mechanical Engineering Resolution (electron density) Analytical chemistry chemistry.chemical_element Atmospheric temperature range Condensed Matter Physics Thermal diffusivity Amorphous solid Metallic alloy chemistry Mechanics of Materials General Materials Science Diffusion (business) |
| Zdroj: | Materials Science and Engineering: B. 10:165-169 |
| ISSN: | 0921-5107 |
| DOI: | 10.1016/0921-5107(91)90122-c |
| Popis: | The diffusion of gold in amorphous W80N20 deposited onto oxidized silicon substrates is investigated by the radiotracer method using ion beam sputtering as a serial sectioning technique with high depth resolution. The diffusivity in the investigated temperature range (733–775 K) is given by D( 195 Au ) = 5.83 × 10 −9 exp (−195 kJ mol −1 /RT) m 2 s −1 . A comparison with available data on diffusion in amorphous metallic alloys shows that gold diffusion in amorphous W-N is indeed an extremely slow process. |
| Databáze: | OpenAIRE |
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