Tuning metal-insulator behavior in LaTiO3/SrTiO3 heterostructures integrated directly on Si(100) through control of atomic layer thickness

Autor: Joseph H. Ngai, M. Chrysler, Ricky Hensley, Hanghui Chen, Tongjie Chen, Zheng Hui Lim, Kamyar Ahmadi-Majlan, Dong Su, Divine Kumah, Patrick Conlin
Rok vydání: 2018
Předmět:
Zdroj: Applied Physics Letters. 112:193104
ISSN: 1077-3118
0003-6951
DOI: 10.1063/1.5018069
Popis: We present electrical and structural characterization of epitaxial LaTiO3/SrTiO3 heterostructures integrated directly on Si(100). By reducing the thicknesses of the heterostructures, an enhancement in carrier-carrier scattering is observed in the Fermi liquid behavior, followed by a metal to insulator transition in the electrical transport. The insulating behavior is described by activated transport, and its onset occurs near an occupation of 1 electron per Ti site within the SrTiO3, providing evidence for a Mott driven transition. We also discuss the role that structure and gradients in strain could play in enhancing the carrier density. The manipulation of Mott metal-insulator behavior in oxides grown directly on Si opens the pathway to harnessing strongly correlated phenomena in device technologies.
Databáze: OpenAIRE