Characterization of plasma-assisted CVD multilayers/heterostructures

Autor:	H. Buhay, C.B. Freidhoff, W.D. Partlow, M.G. Burke, R.M. Young
Rok vydání:	1991
Předmět:	Materials science business.industry Optoelectronics Heterojunction General Medicine Plasma business Characterization (materials science)
Zdroj:	Proceedings, annual meeting, Electron Microscopy Society of America. 49:804-805
ISSN:	2690-1315 0424-8201
DOI:	10.1017/s0424820100088336
Popis:	Amorphous refractory materials can be used in a number of optoelectronic applications when fabricated in multilayer structures. When the layers are deposited with very small thicknesses, heterostructures are produced. Such structures have an adjustable optical bandgap because the wavelength of light is much larger than the distance over which the composition of the film varies (layer to layer). Thicker multilayer structures can be fabricated on metallized, high thermal conductivity substrates. The purpose of the structure is to both protect and modify the substrate's properties. Two types of plasma-assisted chemical vapor deposition (PACVD) techniques have been employed to produce these structures.
Databáze:	OpenAIRE
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