Preparation of near-1-µm-thick {100}-oriented epitaxial Y-doped HfO2 ferroelectric films on (100)Si substrates by a radio-frequency magnetron sputtering method

Autor:	Takao Shimizu, Yukari Inoue, Takanori Mimura, Yoshitomo Tanaka, Reijiro Shimura, Hiroshi Funakubo
Rok vydání:	2020
Předmět:	Orientation control Materials science business.industry Doping Materials Chemistry Ceramics and Composites Optoelectronics General Chemistry Radio frequency magnetron sputtering Condensed Matter Physics Epitaxy business Ferroelectricity
Zdroj:	Journal of the Ceramic Society of Japan. 128:539-543
ISSN:	1348-6535 1882-0743
DOI:	10.2109/jcersj2.20019
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9d8428abe295503a77fe16df993a62a8 https://doi.org/10.2109/jcersj2.20019 Zobrazit plný text záznamu