Study of thermal stability of nickel silicide by X-ray reflectivity

Autor:	O. Chamirian, Alain M. Jonas, Jorge A. Kittl, Bert Brijs, Anne Lauwers, Karen Maex, Wilfried Vandervorst, Youssef Travaly, M. Van Hove, Timo Sajavaara
Rok vydání:	2005
Předmět:	Chemistry Analytical chemistry Condensed Matter Physics Rutherford backscattering spectrometry Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials X-ray reflectivity Elastic recoil detection Condensed Matter::Materials Science chemistry.chemical_compound Transmission electron microscopy X-ray crystallography Silicide Thermal stability Electrical and Electronic Engineering Sheet resistance
Zdroj:	Microelectronic Engineering. 82:492-496
ISSN:	0167-9317
Popis:	The thermal stability of Ni silicide, in comparison to the more conventionally used Co silicide, is studied by X-ray reflectivity. These data were complemented by sheet resistance measurements, transmission electron microscopy, time-of-flight Rutherford backscattering spectrometry, X-ray diffraction and time-of-flight elastic recoil detection analysis.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9d512fe66706798607be17a94a186ad5 https://doi.org/10.1016/j.mee.2005.07.048 Zobrazit plný text záznamu Full Text from ScienceDirect