Organometallic Chemical Vapor Deposition of Aluminum Nitride and Aluminum Metal

Autor: David C. Boyd, Richard T. Haasch, Kwok-Lun Ho, Jen-Wei Hwang, Wayne L. Gladfelter, John F. Evans, Klavs F. Jensen, Roland K. Schulze
Rok vydání: 1990
Předmět:
Zdroj: Metal-Metal Bonds and Clusters in Chemistry and Catalysis ISBN: 9781489924940
Popis: Research Goals and Approach. Thin films of solids are important because of a particular physical property, such as electrical or thermal conductivity, mechanical strength, or refractive index. These properties are determined by both the atomic (crystal) structure of the material as well as the microstructure (i. e. grain size, pore volume, etc.). The fundamental question which forms the foundation of our research program in materials is: What is the relationship between the chemical reaction mechanism of the film forming step and the atomic and microstructural features of the film? Because we can systematically change the mechanism of a reaction by modifying the molecular structure of the precursor, we may develop an additional parameter upon which the physical properties of the film would depend.
Databáze: OpenAIRE