THE SULPHURIC ACID SOLVENT SYSTEM: PART V. SOLUTIONS OF SOME ORGANOSILICON COMPOUNDS

Autor:	R. H. Flowers, E. A. Robinson, R. J. Gillespie
Rok vydání:	1963
Předmět:	chemistry.chemical_classification Hexamethyldisiloxane Silicon Coordination number Organic Chemistry Inorganic chemistry chemistry.chemical_element General Chemistry Polymer Catalysis Ion chemistry.chemical_compound chemistry Polymerization Dimethyldiethoxysilane Polymer chemistry Organosilicon
Zdroj:	Canadian Journal of Chemistry. 41:2464-2471
ISSN:	1480-3291 0008-4042
Popis:	The cryoscopic and conductimetric behavior of solutions of hexamethyldisiloxane, trimethylethoxysilane, dimethyldiethoxysilane, methyltriethoxysilane, and tetraphenylsilane in 100% sulphuric acid has been investigated. The measurements show that stable non-electrolytes such as (CH3)3Si·HSO4 and (CH3)2Si(HSO4)2 are formed from the tri- and di-alkyl compounds. Species such as CH3Si(HSO4)3, which are presumably formed in the reaction of monoalkyl compounds, and Si(HSO4)4, which it is reasonable to suppose is the initial product from the cleavage of tetraphenylsilane, are unstable and polymerize to give polymers containing Si—O—Si bridging groups. No evidence was obtained for the formation of siliconium ions or for the formation of compounds containing silicon with a coordination number greater than four.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9d2cdf273b9b5b606a877a365cca8947 https://doi.org/10.1139/v63-363 Zobrazit plný text záznamu