Y2O3 optical constants between 5 nm and 50 nm
Autor: | Benjamin D. Smith, Anthony Willey, Stephanie M. Thomas, Joseph B. Muhlestein, Margaret Miles, David D. Allred, R. Steven Turley |
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Rok vydání: | 2019 |
Předmět: |
Materials science
business.industry Analytical chemistry Synchrotron radiation chemistry.chemical_element 02 engineering and technology Yttrium 021001 nanoscience & nanotechnology 01 natural sciences Electromagnetic radiation Atomic and Molecular Physics and Optics 010309 optics Wavelength Optics chemistry Ellipsometry 0103 physical sciences Atom Thin film 0210 nano-technology business Refractive index |
Zdroj: | Optics Express. 27:3324 |
ISSN: | 1094-4087 |
Popis: | We report optical constants of e-beam evaporated yttrium oxide Y2O3 thin films as determined from angle-dependent reflectance measurements at wavelengths from 5 to 50 nm. Samples were measured using synchrotron radiation at the Advanced Light Source. The experimental reflectance data were fit to obtain values for the index of refraction and thin film roughness. We compare our computed constants with those of previous researchers and those computed using the independent atom approximation from the CXRO website. We found that the index of refraction near 36 nm is much lower than previous data from Tomiki as reported by Palik. The real part of the optical constants is about 10% to 15% below CXRO values for wavelengths between 17 nm and 30 nm. Films were also characterized chemically, structurally, and optically by ellipsometry and atomic force microscopy. |
Databáze: | OpenAIRE |
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