Modeling of Al_2O_3 Thin Film Growth in Modern Ion Coating Processes

Autor:	Detlev Ristau, Karsten Heinrich, Henrik Ehlers, Marcus Turowski
Rok vydání:	2013
Předmět:	Materials science Layer by layer Nanotechnology Surface finish engineering.material Ion Condensed Matter::Materials Science Molecular dynamics Coating Chemical engineering Condensed Matter::Superconductivity engineering Surface roughness Deposition (phase transition) Thin film
Zdroj:	Optical Interference Coatings.
Popis:	Classical molecular dynamics techniques are used for modeling Al2O3 thin film growth according to modern ion coating processes. Results for surface roughness and film density dependent on deposition energy are presented.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9cef39c960580192e62ff9778626cbd7 https://doi.org/10.1364/oic.2013.ma.8 Zobrazit plný text záznamu