Reliability Improvement of Gate-All-Around SONOS Memory by Joule Heat From Gate-Induced Drain Leakage Current

Autor:	Jung-Woo Lee, Joon-Kyu Han, Ji-Man Yu, Geon-Beom Lee, Il-Woong Tcho, Yang-Kyu Choi
Rok vydání:	2022
Předmět:	Electrical and Electronic Engineering Electronic Optical and Magnetic Materials
Zdroj:	IEEE Transactions on Electron Devices. 69:115-119
ISSN:	1557-9646 0018-9383
DOI:	10.1109/ted.2021.3131288
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9ce4f30ff77756eab5e121c712886204 https://doi.org/10.1109/ted.2021.3131288 Zobrazit plný text záznamu