Deposition of Plasma Silicon Oxide Thin Films in a Production Planar Reactor
| Autor: | John R. Hollahan |
|---|---|
| Rok vydání: | 1979 |
| Předmět: |
Materials science
Renewable Energy Sustainability and the Environment Nanocrystalline silicon Equivalent oxide thickness Condensed Matter Physics Oxide thin-film transistor Surfaces Coatings and Films Electronic Optical and Magnetic Materials Carbon film Chemical engineering Plasma-enhanced chemical vapor deposition Materials Chemistry Electrochemistry Deposition (phase transition) Thin film Silicon oxide |
| Zdroj: | Journal of The Electrochemical Society. 126:930-934 |
| ISSN: | 1945-7111 0013-4651 |
| DOI: | 10.1149/1.2129196 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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