Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand

Autor:	Seongyoon Kim, Romel Hidayat, Hyeonsu Roh, Jaemin Kim, Hye-Lee Kim, Khabib Khumaini, Mira Park, Jang-Hyeon Seok, Jung Woo Park, Won-Jun Lee
Rok vydání:	2022
Předmět:	Materials Chemistry General Chemistry
Zdroj:	Journal of Materials Chemistry C. 10:6696-6709
ISSN:	2050-7534 2050-7526
DOI:	10.1039/d2tc00574c
Popis:	We studied the atomic layer deposition (ALD) of titanium oxide (TiO2) thin films using a newly developed heteroleptic titanium precursor with a linked ligand.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9ca2568d46e5d89fbb4c3ee2631feb82 https://doi.org/10.1039/d2tc00574c Zobrazit plný text záznamu