| Popis: |
Electron beam lithography (EBL) evolved from patterning with modified scanning electron microscopes, to today’s dedicated systems for routine exploration of prototype devices at the nanoscale. Resist and substrate materials, processes, electron sources, electron optics, and software for high levels of resolution and precision are detailed. Possible future developments include higher energy beams and multi-beam systems for higher throughput. Examples of nanostructures along with fabrication issues in the fields of spintronics, photonics, patterned media for disk drives, X-ray optics, high-frequency electronics, carbon nanotubes, and nanowires are presented. |
