dc magnetron system for cathode sputtering

Autor:	E. D. Atanasova, N. Ivanov, K.I. Kirov, GM Minchev
Rok vydání:	1976
Předmět:	Materials science business.industry Hot cathode Condensed Matter Physics Cathode Surfaces Coatings and Films law.invention law Torr Cavity magnetron Optoelectronics Cold cathode High-power impulse magnetron sputtering business Instrumentation Intensity (heat transfer) Order of magnitude
Zdroj:	Vacuum. 26:237-241
ISSN:	0042-207X
DOI:	10.1016/s0042-207x(76)80483-6
Popis:	A dc magnetron system for cathode sputtering with a spool-shaped cathode is described. In comparison with the cylindrical cathode, the spool-shaped cathode increases the intensity of the discharge by one order of magnitude for gas pressures of 10 −2 to 10 −3 torr. The main characteristics of the system are described.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9c43253d175dc0f67b28ddcccb6d7731 https://doi.org/10.1016/s0042-207x(76)80483-6 Zobrazit plný text záznamu