RESURF p-n Diode With a Buried Layer, a Comprehensive Study
Autor: | Jeng Gong, Hsiao-Chin Tuan, Ru-Yi Su, Chih-Fang Huang, C.H. Tsai, Fu-Jen Yang |
---|---|
Rok vydání: | 2013 |
Předmět: | |
Zdroj: | IEEE Transactions on Electron Devices. 60:3835-3841 |
ISSN: | 1557-9646 0018-9383 |
DOI: | 10.1109/ted.2013.2283582 |
Popis: | In this paper, important parameters of the p-buried layer of a high-voltage reduced surface field p-n diode are analyzed and discussed in terms of effects on device performance, including breakdown voltage and specific turn-on resistance, Ron,sp. Guidelines for optimizing the vertical position, lateral location, and doping concentration of the p-buried layer are suggested. The experimental results demonstrate that the p-n diode with the proposed p-buried layer optimization design can improve breakdown voltage by 30.7% but only increases 2.7% in specific on-resistance Ron,sp. |
Databáze: | OpenAIRE |
Externí odkaz: |