Self-aligned PtSi Fully Silicided (FUSI) Metal Gates for 45 nm CMOS Applications
| Autor: | Mark van Dal, A. Lauwers, J. Cunniffe, R. Verbeeck, C. Vrancken, C. Demeurisse, J.A. Kittl, K. Maex |
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| Rok vydání: | 2006 |
| Zdroj: | ECS Meeting Abstracts. :634-634 |
| ISSN: | 2151-2043 |
| DOI: | 10.1149/ma2005-01/14/634 |
| Popis: | not Available. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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