The dependence of AlN molar fraction of AlGaN in wet etching by using tetramethylammonium hydroxide aqueous solution

Autor:	Yuta Kawase, Motoaki Iwaya, Kosuke Sato, Tetsuya Takeuchi, Yusuke Sakuragi, Isamu Akasaki, Satoshi Kamiyama, Shinji Yasue, Sho Iwayama, Junya Ikeda
Rok vydání:	2019
Předmět:	Tetramethylammonium hydroxide chemistry.chemical_compound Aqueous solution Materials science Physics and Astronomy (miscellaneous) chemistry General Engineering General Physics and Astronomy Mole fraction Nuclear chemistry
Zdroj:	Japanese Journal of Applied Physics. 58:SCCC30
ISSN:	1347-4065 0021-4922
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9bff19468c5843a1d37adf57c0727f01 https://doi.org/10.7567/1347-4065/ab112a Zobrazit plný text záznamu