A study of AFM-based scratch process on polycarbonate surface and grating application
| Autor: | El-Hang Lee, Dong-Jin Lee, Seung-Gol Lee, Beom-Hoan O, Jun-Ho Sung, Chul Hyun Choi, Se-Geun Park, Min-Woo Lee |
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| Rok vydání: | 2010 |
| Předmět: |
Diffraction
Materials science business.industry General Physics and Astronomy Surfaces and Interfaces General Chemistry Substrate (electronics) Nanoindentation Grating Condensed Matter Physics Surfaces Coatings and Films Optics Scratch Polymer substrate business Lithography Layer (electronics) computer computer.programming_language |
| Zdroj: | Applied Surface Science. 256:7668-7671 |
| ISSN: | 0169-4332 |
| DOI: | 10.1016/j.apsusc.2010.06.025 |
| Popis: | We report on the possibility of applying atomic force microscope (AFM) lithography to draw micro/nano-structures on the surface of a polycarbonate (PC) substrate. We also fabricated a grating structure on the PC surface using the scratch method. An AFM silicon tip coated with a diamond layer was utilized as a cutting tool to scratch the surface of the sample. In order to obtain pattern depth deeper than the control method of interaction force, we used a scanner movement method which the sample scanner moves along the Z-axis. A grating of 100 μm × 150 μm was fabricated by the step and repeat method wherein the sample stage is moved in the direction of the XY-axis. The period and the depth of the grating are 500 and 50 nm, respectively. Light of 632.8 nm wavelength was diffracted on the surface of the PC substrate. |
| Databáze: | OpenAIRE |
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