Polarity and Patterning Effect on Plasma Charging Levels by Metal-Gate Coupled Recorder Arrays

Autor:	Kai-Wei Yang, Ting Gan, Jiaw-Ren Shih, Chrong Jung Lin, Ya-Chin King
Rok vydání:	2022
Předmět:	Electrical and Electronic Engineering Electronic Optical and Magnetic Materials
Zdroj:	IEEE Transactions on Electron Devices. 69:6971-6976
ISSN:	1557-9646 0018-9383
DOI:	10.1109/ted.2022.3215486
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9bdde945584893676f1a88479695a6bc https://doi.org/10.1109/ted.2022.3215486 Zobrazit plný text záznamu