Hot-wire deposition of photonic-grade amorphous silicon
| Autor: | A.H. Mahan, C.M. Fortmann, Nobuhiro Hata, Wayne A. Anderson, Enrique L. Jaen |
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| Rok vydání: | 2001 |
| Předmět: |
Amorphous silicon
Materials science Silicon business.industry Hybrid silicon laser Metals and Alloys Nanocrystalline silicon chemistry.chemical_element Surfaces and Interfaces Surfaces Coatings and Films Electronic Optical and Magnetic Materials Amorphous solid chemistry.chemical_compound Optics chemistry Materials Chemistry Optoelectronics Photonics Thin film business Refractive index |
| Zdroj: | Thin Solid Films. 395:142-146 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/s0040-6090(01)01239-1 |
| Popis: | A new amorphous silicon application related to the patterning of refractive index for the purpose of defining and integrating photonic-device elements is emerging. Photonic device elements include waveguides, splitters, mirrors, optical memories, etc. Hot-wire-deposited amorphous silicon has several attributes that make it an exceedingly attractive matrix for photonic device patterning, including: high hydrogen solubility limits; relatively little sub-gap absorption; low stress; non-peeling films; and fast, economical deposition of thick (≥5 μm) films, as well as optically smooth as-deposited surfaces, even on thick films. The growing catalog of proposed and/or demonstrated amorphous silicon-based optical devices is rapidly expanding. |
| Databáze: | OpenAIRE |
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