HIGH-RATE HIGH-DENSITY ICP ETCHING OF GERMANIUM

Autor:	E. S. Rogovsky, P. B. Lagov, A. S. Drenin, Vitalii A. Bondariev, Vladimir M. Maslovsky, Yu. S. Pavlov
Rok vydání:	2019
Předmět:	High rate Materials science business.industry chemistry.chemical_element High density Germanium General Medicine law.invention chemistry law Etching (microfabrication) Solar cell Optoelectronics business
Zdroj:	High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes. 23:57-70
ISSN:	1093-3611
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9b9819bdcfc30f423656130868fb9910 https://doi.org/10.1615/hightempmatproc.2019029959 Zobrazit plný text záznamu