Linewidth control in deep UV contact lithography
| Autor: | Michel Iost, Bernard Bru, Serge Gourrier, Patrick Rabinzohn, Francois Pasqualini |
|---|---|
| Rok vydání: | 1987 |
| Předmět: |
Laser linewidth
Materials science business.industry Optoelectronics X-ray lithography Electrical and Electronic Engineering Condensed Matter Physics business Lithography Atomic and Molecular Physics and Optics Next-generation lithography Surfaces Coatings and Films Electronic Optical and Magnetic Materials |
| Zdroj: | Microelectronic Engineering. 6:69-75 |
| ISSN: | 0167-9317 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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