Large area VHF plasma production by a balanced power feeding method
| Autor: | Y. Takeuchi, T. Shioya, Yasuhiro Yamauchi, Hiromu Takatsuka, Yoshinobu Kawai, Hiroshi Muta, Tatsuyuki Nishimiya |
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| Rok vydání: | 2008 |
| Předmět: |
Electron density
Chemistry business.industry technology industry and agriculture Metals and Alloys Analytical chemistry Surfaces and Interfaces Plasma Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Power (physics) symbols.namesake law Solar cell Materials Chemistry symbols Optoelectronics Langmuir probe Electron temperature Plasma diagnostics Thin film business |
| Zdroj: | Thin Solid Films. 516:4430-4434 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2007.10.016 |
| Popis: | We developed a VHF plasma source using a balanced power feeding method and investigated the characteristics of the VHF plasma with the Langmuir probe. It was found that the new VHF plasma source provides higher electron density plasma that is favorable for increasing the deposition rate of microcrystalline silicon films. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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