| Autor: |
Jung Chao Hsu, Ming Tsung Hung, Jui Chieh Chen |
| Rok vydání: |
2014 |
| Předmět: |
|
| Zdroj: |
Advanced Materials Research. 893:679-682 |
| ISSN: |
1662-8985 |
| DOI: |
10.4028/www.scientific.net/amr.893.679 |
| Popis: |
Thermolithography uses heat as the exposure source which has the possibility to generate patterns with minimum feature size exceeding the diffraction limit in photolithography. In addition, heat transport is much slower than light which allows us to control the transport distance. In this manuscript, we use transient heating to generate micro patterns of polymer resist with different thickness. The experiments use thin film micro-heaters with pulsed heating. Different pulse widths and periods are used to control the temperature rises and accumulated heating durations. The trend of the resulting resist thicknesses reveals the important role of the relaxation time in the crosslinking reaction. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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