Wet Cleaning of Trenches and Vias after Oxide/Nitride Dry Etch with Cu Exposed

Autor:	Jason Chi-Hao Shao, Lewis Liu, Steven Verhaverbeke
Rok vydání:	2001
Předmět:	chemistry.chemical_compound Materials science chemistry Metallurgy Oxide Wet cleaning General Materials Science Dry etching Nitride Condensed Matter Physics Atomic and Molecular Physics and Optics
Zdroj:	Solid State Phenomena. :311
ISSN:	1662-9779
DOI:	10.4028/www.scientific.net/ssp.76-77.311
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9b34216acca3ee81e6136e604747c572 https://doi.org/10.4028/www.scientific.net/ssp.76-77.311 Zobrazit plný text záznamu