Nano electron source fabricated by beam-induced deposition and its unique feature
Autor: | Mikio Takai, Katsuhisa Murakami |
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Rok vydání: | 2015 |
Předmět: |
Materials science
business.industry Electron Condensed Matter Physics Electron beam physical vapor deposition Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Field emission microscopy Field electron emission Ion beam deposition Nanocrystal Physics::Accelerator Physics Optoelectronics Electrical and Electronic Engineering Atomic physics Electron beam-induced deposition business Field ion microscope |
Zdroj: | Microelectronic Engineering. 132:74-82 |
ISSN: | 0167-9317 |
Popis: | The fabrication of nanoscale field emitters with gate structures using beam-induced deposition and their field emission properties are described. Nano electron sources can be fabricated by electron-beam-induced deposition without additional processes. The inherent issues of process contamination and the effectiveness of post cleaning using annealing or radical oxygen gas exposure to remove contaminants introduced during beam deposition are also discussed. In addition, coherent electron beams for electron wave interference emitted from a beam-deposited Pt field emitter were investigated by field emission microscopy and field ion microscopy. The interference fringe patterns observed for beam-deposited Pt field emitters were attributed to electron wave interference occurring at two adjacent emission sites on a single Pt nanocrystal. |
Databáze: | OpenAIRE |
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