Sharp-switching Z2-FET device in 14 nm FDSOI technology
| Autor: | Pascal Fonteneau, P. Ferrari, H. El Dirani, Sorin Cristoloveanu, Yohann Solaro |
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| Rok vydání: | 2015 |
| Předmět: |
010302 applied physics
Materials science Silicon business.industry chemistry.chemical_element Silicon on insulator 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences 7. Clean energy Subthreshold slope Impact ionization chemistry Modulation Logic gate 0103 physical sciences Optoelectronics Node (circuits) 0210 nano-technology business Voltage |
| Zdroj: | ESSDERC |
| Popis: | Z2-FET (Zero Impact Ionization and Zero Subthreshold Slope FET) is a very recent sharp switching device which achieves remarkable performance in terms of leakage current and triggering control. The device is fabricated with Ultra-Thin Body and Buried Oxide (UTBB) Silicon-On-Insulator (SOI) technology, features an extremely sharp on-switch, an adjustable triggering voltage (V ON ), and can be considered for Electro-Static Discharge (ESD). The operation of our device relies on the modulation of electrons and holes injection barriers. In this paper, we show, for the first time, experimental data obtained on the 14 nm FDSOI (Fully Depleted SOI) node. |
| Databáze: | OpenAIRE |
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