Impact of De-molding Force on Exposure Dosage in UV-Nanoimprint Process

Autor: Tamano Hirasawa, Nobuji Sakai, Hiroaki Kawata, Toshiaki Tanabe, Yoshihiko Hirai, Noriyoshi Fujii
Rok vydání: 2009
Předmět:
Zdroj: Journal of Photopolymer Science and Technology. 22:181-184
ISSN: 1349-6336
0914-9244
DOI: 10.2494/photopolymer.22.181
Popis: Mold releasing forces are experimentally measured in various exposure dosages for UV nanoimprint resist. PAK01 resist is examined to evaluate the chemical conversion by FTIR. Time dependent conversion ratio is measured under UV exposure and the conversion ratio of the UV resin versus exposed dosages is verified. Also, releasing forces for various exposure dosages are mechanically measured for flat mold. The results show the measured releasing force is not stabilized until the conversion is completed up to over around 90 %. Based on these results, the minimums exposure dosage is known for successful releasing.
Databáze: OpenAIRE