| Autor: | Yu. V. Tolokonnikova, E. G. Orlikova, V. M. Izgorodin, A. A. Aushev, I. V. Sevryugin |
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| Rok vydání: | 2001 |
| Předmět: |
Glow discharge
Argon Silicon dioxide technology industry and agriculture Analytical chemistry chemistry.chemical_element engineering.material equipment and supplies Glass microsphere chemistry.chemical_compound chemistry Coating Impurity engineering Deposition (phase transition) Physical and Theoretical Chemistry Composite material Carbon |
| Zdroj: | High Energy Chemistry. 35:123-127 |
| ISSN: | 0018-1439 |
| DOI: | 10.1023/a:1004177624042 |
| Popis: | Laser fusion research demands microsized hollow shells with a large diameter and a thick wall. Because these geometric parameters are difficult to provide by fabrication, the wall thickness was increased by deposition of a silicon dioxide film on the outer surface of glass microspheres. The film was obtained by decomposition of tetraethoxysilane vapor in a low-frequency discharge plasma in mixtures with argon and oxygen. The thickness of coating was shown to be a linear function of the deposition time and the consumption of the precursor organoelement compound. The composition of plasma-deposited layers was studied and their density and refractive index were determined. Elemental analysis data showed that the coating comprised silicon dioxide with carbon and hydrogen impurities. |
| Databáze: | OpenAIRE |
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