Photo-interferometric spectroscopic ellipsometry
| Autor: | J. C. Martinez-Anton, Óscar Esteban |
|---|---|
| Rok vydání: | 2004 |
| Předmět: |
Materials science
Silicon business.industry Metals and Alloys chemistry.chemical_element Surfaces and Interfaces Polarization (waves) Spectral line Surfaces Coatings and Films Electronic Optical and Magnetic Materials Interferometry Optics chemistry Reference beam Materials Chemistry Reference surface Newton's rings Thin film business |
| Zdroj: | Thin Solid Films. :90-94 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2003.12.050 |
| Popis: | Interference in an air gap between a reference surface (a glass) and the surface to measure can be used to obtain its reflectance in a robust way and also to obtain the ellipsometric parameter Δ. In the methodology proposed, there is no need to measure a reference beam. From several reflection spectra taken at different air-gap thicknesses and at p and s polarization, we get three magnitudes R p , R s and Δ. We describe the technique and demonstrate experimentally its viability. A sample of silicon with a thin layer of thermally grown silica is used for such purpose. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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