Improving thickness uniformity of sputter-deposited films by using magnet rotation speed control technique

Autor:	Makoto Usuki, Takashi Nakagawa, Seiichi Omoto, Shota Takita, Tatsuhiko Miura, Katsuyasu Shiba, Tsutomu Sato
Rok vydání:	2018
Předmět:	Condensed Matter::Materials Science Materials science business.industry Sputtering Magnet Optoelectronics Process control Rotational speed Magnetic films Magnetic semiconductor business Advanced process control
Zdroj:	2018 International Symposium on Semiconductor Manufacturing (ISSM).
DOI:	10.1109/issm.2018.8651152
Popis:	The method of improving thickness uniformity of sputter-deposited film by using magnet rotation speed control technique as an advanced process control (APC) is discussed. It is demonstrated that magnet rotation speed control technique can improve both film thickness uniformity and its variation.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9ad501cb6af6e58ed491fd53acd1a98d https://doi.org/10.1109/issm.2018.8651152 Zobrazit plný text záznamu