Control of large area VHF plasma produced at high pressure
| Autor: | Tsukasa Yamane, Hiromu Takatsuka, Kiichiro Uchino, Hiroshi Muta, Yoshinobu Kawai, Yoshiaki Takeuchi, Tatsuyuki Nishimiya, Yasuhiro Yamauchi |
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| Rok vydání: | 2011 |
| Předmět: |
Solid-state chemistry
Materials science business.industry Metals and Alloys Very high frequency Surfaces and Interfaces Plasma Surfaces Coatings and Films Electronic Optical and Magnetic Materials Microcrystalline silicon High pressure Electrode Materials Chemistry Variable capacitor Optoelectronics business |
| Zdroj: | Thin Solid Films. 519:6931-6934 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2011.01.379 |
| Popis: | The control of very high frequency (VHF) discharge plasma at high pressures was attempted by loading a variable capacitor to the end of the multi rod electrode with which VHF plasma (frequency 60 MHz) was produced. It was found that the discharge region is controlled with the variable capacitor and VHF plasma uniform over 1 m is produced at high pressures. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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