Distributed-grating Wavelength Demultiplexer in SOI

Autor:	Eric Bisaillon, Andrew G. Kirk, Lukas Chrostowski, M.C. Nadeau, D.T.H. Tan
Rok vydání:	2006
Předmět:	Fabrication Materials science business.industry Physics::Optics Silicon on insulator Grating Computer Science::Other law.invention Optics law Etching (microfabrication) Wavelength-division multiplexing Blazed grating Optoelectronics business Optical add-drop multiplexer Diffraction grating
Zdroj:	2006 IEEE LEOS Annual Meeting Conference Proceedings.
DOI:	10.1109/leos.2006.279215
Popis:	A shallow-etched, distributed grating is proposed as a wavelength demultiplexer. Modeling results predict up to 79% efficiency over a 60 nm wavelength range. Device fabrication and measurements are presented
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9a79c530487f3da859daa9bd13675e96 https://doi.org/10.1109/leos.2006.279215 Zobrazit plný text záznamu