| Popis: |
The placement-error correction for low-energy electron-beam proximity-projection lithography (LEEPL) has been demonstrated to enable the overlay accuracy of 23 nm that meets the requirement for the 65-nm node. The overlay accuracy for LEEPL-ArF mix-and-match lithography has been analyzed, focusing separately on the intra-field error, the inter-field error, and the dynamic fluctuation over different wafers. It has been found that the intra-field error, mainly due to the distortion of a 1x stencil mask, can be effectively corrected for by using the fine deflection of the electron beam, a unique capability of the LEEPL exposure equipment. In addition, the inter-field error can be suppressed by correcting in real time for the magnification error of each chip detected by the die-by-die alignment system. The dynamic variation in the total overlay error is also small, and the overall alignment accuracy is fairly compatible with the preliminary overlay budget. |
