Efficient continuum sources for x‐ray lithography

Autor:	James S. Greeneich
Rok vydání:	1975
Předmět:	Physics Optics Physics and Astronomy (miscellaneous) business.industry Resolution (electron density) Continuum (design consultancy) X-ray lithography business Lithography
Zdroj:	Applied Physics Letters. 27:579-581
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.88319
Popis:	Efficient x‐ray sources whose dominant output is from the x‐ray continuum are examined experimentally for use in x‐ray lithography. At 10 kV with a 6‐μm Mylar mask and 50‐μm Be window, a Au continuum source is more than 3 times as efficient as the Al Kα source. Submicrometer resolution can be obtained with x‐ray continuum sources.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::996bf5c5c83fbcb31c75c3e5ae37071e https://doi.org/10.1063/1.88319 Zobrazit plný text záznamu