Influence of the microstructure on the thermal properties of thin polycrystalline diamond films
| Autor: | Wolfgang Jäger, Reinhard Zachai, H. Reiß, A. Flöter, D. Wittorf, H. Verhoeven |
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| Rok vydání: | 1997 |
| Předmět: |
Materials science
Physics and Astronomy (miscellaneous) Silicon Material properties of diamond Analytical chemistry Diamond chemistry.chemical_element Substrate (electronics) Chemical vapor deposition engineering.material Thermal conduction Thermal conductivity chemistry engineering Composite material High-resolution transmission electron microscopy |
| Zdroj: | Applied Physics Letters. 71:1329-1331 |
| ISSN: | 1077-3118 0003-6951 |
| DOI: | 10.1063/1.119886 |
| Popis: | Highly oriented and columnar grained diamond layers only a few microns thick, deposited at different substrate temperatures (500, 550, and 800 °C) on silicon using microwave-plasma-assisted chemical vapor deposition, are investigated by special photothermal techniques and high-resolution transmission electron microscopy (HRTEM). Small effective diamond–silicon boundary resistances of |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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