Controlling Domain Orientations in Thin Films of AB and ABA Block Copolymers
| Autor: | Ginusha M. Perera, Gila E. Stein, Nikhila Mahadevapuram, Thai Vu |
|---|---|
| Rok vydání: | 2011 |
| Předmět: |
Nanostructure
Materials science Polymers and Plastics Annealing (metallurgy) Organic Chemistry engineering.material Methacrylate law.invention Inorganic Chemistry Coating Optical microscope Chemical engineering law Polymer chemistry Materials Chemistry engineering Copolymer Lamellar structure Thin film |
| Zdroj: | Macromolecules. 44:6121-6127 |
| ISSN: | 1520-5835 0024-9297 |
| DOI: | 10.1021/ma2009222 |
| Popis: | Domain orientations in thin films of lamellar copolymers are evaluated as a function of copolymer architecture, film thickness, and processing conditions. Two copolymer architectures are considered: An AB diblock of poly(styrene-b-methyl methacrylate) and an ABA triblock of poly(methyl methacrylate-b-styrene-b-methyl methacrylate). All films are cast on substrates that are energetically neutral with respect to the copolymer constituents. Film structures are evaluated with optical microscopy, atomic force microscopy, and grazing-incidence small-angle X-ray scattering. For AB diblock copolymers, the domain orientations are very sensitive to film thickness, annealing temperature, and imperfections in the “neutral” substrate coating: Diblock domains are oriented perpendicular to the substrate when annealing temperature is elevated (≥220 °C) and defects in the substrate coating are minimized; otherwise, parallel or mixed parallel/perpendicular domain orientations are detected for most film thicknesses. For ABA... |
| Databáze: | OpenAIRE |
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