Autor: |
J.L. Freeouf, M. Wittmer |
Rok vydání: |
1993 |
Předmět: |
|
Zdroj: |
Physics Letters A. 173:190-194 |
ISSN: |
0375-9601 |
DOI: |
10.1016/0375-9601(93)90185-3 |
Popis: |
The interface states at metal-semiconductor junctions are still a matter of debate. We present a novel approach to this issue that uses state-of-the-art techniques to prepare silicon surfaces with different surface terminations and employs non-interacting Schottky contacts to measure the barrier height. We report a difference of 50 mV in barrier height for Hg Schottky diodes on Si(111) surfaces with different surface terminations. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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