Magnetron discharge sputtering for fabrication of nanogradient optical coatings
| Autor: | S. V. Shkatula, G F Ermakov, Yu A Obod, N V Silin, A. I. Kuzmichev, O. D. Volpian, A. I. Krikunov |
|---|---|
| Rok vydání: | 2015 |
| Předmět: |
History
Fabrication Materials science Silicon business.industry Analytical chemistry chemistry.chemical_element Dielectric Computer Science Applications Education Electric discharge in gases Optical coating chemistry Sputtering Cavity magnetron Optoelectronics High-power impulse magnetron sputtering business |
| Zdroj: | Journal of Physics: Conference Series. 652:012009 |
| ISSN: | 1742-6596 1742-6588 |
| DOI: | 10.1088/1742-6596/652/1/012009 |
| Popis: | The technology of the middle frequency pulse reactive magnetron sputtering for fabrication of nanogradient optical coatings with smooth variation of refractive index was developed and studied. The technology is based on programmable motion of a substrate over two magnetrons with targets of different materials. The feature of the deposition process is a constant composition of reactive gas medium and an invariable magnetron operation mode. To realize this technology, an automatic computer-controlled sputtering system additionally comprising a gas discharge activator of reactive gas (oxygen) and an in situ optical monitor- spectrovisor has been built. The dielectric oxide-based nanogradient coatings of photon-barrier type were successfully fabricated. The obtained results confirm the high potential of the middle frequency pulse reactive magnetron sputtering of silicon and metal targets for fabrication of nanogradient dielectric optical coatings with excellent properties. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|