Tunneling in all-high-Tcedge junctions with deposited barriers

Autor: R. P. Robertazzi, John R. Kirtley, Roger H. Koch, J. M. Viggiano, Robert B. Laibowitz, William J. Gallagher, Alan Willis Kleinsasser, Robert L. Sandstrom
Rok vydání: 1992
Předmět:
Zdroj: Physical Review B. 46:14830-14833
ISSN: 1095-3795
0163-1829
DOI: 10.1103/physrevb.46.14830
Popis: All-high-${\mathit{T}}_{\mathit{c}}$-material edge junctions consisting of laser-ablated Y-Ba-Cu-O electrodes and an in situ rf-sputter-deposited MgO barrier have been fabricated whose I-V characteristics show tunneling-related effects. These include a junction resistance with an exponential dependence on the nominal-barrier thickness, gaplike structure observed in the conductance curves, and Josephson effects. These properties are very sensitive to the choice of materials-processsing method for the junction interfaces.
Databáze: OpenAIRE