Tunneling in all-high-Tcedge junctions with deposited barriers
Autor: | R. P. Robertazzi, John R. Kirtley, Roger H. Koch, J. M. Viggiano, Robert B. Laibowitz, William J. Gallagher, Alan Willis Kleinsasser, Robert L. Sandstrom |
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Rok vydání: | 1992 |
Předmět: | |
Zdroj: | Physical Review B. 46:14830-14833 |
ISSN: | 1095-3795 0163-1829 |
DOI: | 10.1103/physrevb.46.14830 |
Popis: | All-high-${\mathit{T}}_{\mathit{c}}$-material edge junctions consisting of laser-ablated Y-Ba-Cu-O electrodes and an in situ rf-sputter-deposited MgO barrier have been fabricated whose I-V characteristics show tunneling-related effects. These include a junction resistance with an exponential dependence on the nominal-barrier thickness, gaplike structure observed in the conductance curves, and Josephson effects. These properties are very sensitive to the choice of materials-processsing method for the junction interfaces. |
Databáze: | OpenAIRE |
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