Refractive Variable Optical Attenuator Fabricated by Silicon Deep Reactive Ion Etching
| Autor: | Jun Seok Kang, Chang-Soo Park, Yeong Gyu Lee, Jong-Hyun Lee, Sang Ki Yoon, Young Yun Kim, Sung Sik Yun, Hyun Ki Lee |
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| Rok vydání: | 2004 |
| Předmět: |
Materials science
Silicon business.industry Attenuation technology industry and agriculture chemistry.chemical_element Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials law.invention Optics chemistry law Return loss Insertion loss Deep reactive-ion etching Acceptance angle Fiber Electrical and Electronic Engineering business Optical attenuator |
| Zdroj: | IEEE Photonics Technology Letters. 16:485-487 |
| ISSN: | 1041-1135 |
| DOI: | 10.1109/lpt.2003.818948 |
| Popis: | We report on a novel refractive variable optical attenuator with a wedge-shaped silicon optical leaker, in which a part of the light signal is successively transmitted and refracted outside the acceptance angle of the output fiber. This device can be simply fabricated using a deep reactive ion etching and does not require sidewall metallization. We have theoretically estimated its optical characteristics and experimentally showed its high performances, such as low insertion loss of 0.6 dB and wide attenuation range of 43 dB. The fabricated device also showed a high return loss of over 39 dB even in an air-ambient condition and its polarization-dependent loss was smaller than 10% of the attenuation level. |
| Databáze: | OpenAIRE |
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