Impact of hexamethyldisiloxane admixtures on the discharge characteristics of a dielectric barrier discharge in argon for thin film deposition
| Autor: | Markus M. Becker, Detlef Loffhagen, Andreas K. Czerny, Claus-Peter Klages, Jens Philipp |
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| Rok vydání: | 2017 |
| Předmět: |
010302 applied physics
Hexamethyldisiloxane Argon Materials science chemistry.chemical_element 02 engineering and technology Dielectric barrier discharge 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Plasma polymerization chemistry.chemical_compound chemistry 0103 physical sciences Thin film Composite material 0210 nano-technology |
| Zdroj: | Contributions to Plasma Physics. 58:337-352 |
| ISSN: | 0863-1042 |
| DOI: | 10.1002/ctpp.201700060 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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