Stress analysis by finite element method stress for (ZrO2/SiO2)2 anti-reflector multi-layer deposited with ion-assisted electron-gun evaporation

Autor:	Chih-Yuan Chang, Hsi-Chao Chen, Chun-Hao Chang, Kun-Hong Chen, Cheng-En Cai, Wei-Xiang Wang
Rok vydání:	2022
Zdroj:	Optical Technology and Measurement for Industrial Applications Conference 2022.
DOI:	10.1117/12.2660162
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::97b5b1ae611d83dc04d2d8bbe0c8da48 https://doi.org/10.1117/12.2660162 Zobrazit plný text záznamu