Production of metal oxide thin films by pulsed arc molecular beam deposition

Autor:	Jeffrey Mills, James F. Garvey, Robert L. DeLeon, Eric F. Rexer, Donald B. Wilbur
Rok vydání:	2000
Předmět:	Cerium oxide Materials science Vacuum deposition business.industry Scanning electron microscope Electrode Optoelectronics Thin film Sputter deposition business Instrumentation Pulsed laser deposition Titanium oxide
Zdroj:	Review of Scientific Instruments. 71:2125-2130
ISSN:	1089-7623 0034-6748
DOI:	10.1063/1.1150593
Popis:	Deposition for the first time of titanium oxide, cerium oxide, and tin oxide thin films by reactive pulsed arc molecular beam deposition is reported. To produce these thin films, oxygen gas was pulsed between a pair of electrodes situated within a vacuum chamber. A 20 μf storage capacitor was discharged between the electrode pair during the gas pulse. A substrate was placed inline with the oxygen pulse, on which an oxide coating of the electrode material was then coated. The films were analyzed by both scanning electron microscopy and electron spectroscopy for chemical analysis. There was a noted strong dependence of the film surface quality on the melting temperature of the starting electrode material.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::977b59ac28209c4e4ccdd6ab6c4cde92 https://doi.org/10.1063/1.1150593 Zobrazit plný text záznamu